EllipBench: A Large-scale Benchmark for Machine-learning based Ellipsometry Modeling

Read original: arXiv:2407.17869 - Published 7/26/2024 by Yiming Ma, Xinjie Li, Xin Sun, Zhiyong Wang, Lionel Z. Wang

EllipBench: A Large-scale Benchmark for Machine-learning based Ellipsometry Modeling

Overview

This paper provides submission and formatting instructions for the International Conference on Machine Learning (ICML) 2024.
It covers electronic submission, paper formatting, and other requirements for authors.

Plain English Explanation

The paper outlines the guidelines that researchers must follow when submitting their work to the ICML 2024 conference. This includes details on how to electronically submit the paper, as well as the specific formatting requirements, such as page limits, font sizes, and layout.

The instructions ensure that all submitted papers have a consistent look and feel, making it easier for the conference organizers and reviewers to evaluate the research. By adhering to these guidelines, authors can increase the chances of their work being accepted and presented at the prestigious ICML conference.

Technical Explanation

The paper covers the following key elements:

Electronic Submission: It provides step-by-step instructions on how to electronically submit papers to the ICML 2024 conference. This includes details on the submission platform, deadlines, and required information.
Paper Formatting: The instructions outline the specific formatting requirements for ICML 2024 papers, such as page limits, font sizes, line spacing, and margins. It also provides guidance on the structure and organization of the paper.
Supplementary Material: The paper discusses the guidelines for submitting additional supplementary material, such as code, data, or appendices, to support the main paper.
Blind Review Process: The instructions emphasize the importance of maintaining a blind review process, where the authors' identities are hidden from the reviewers. It provides guidance on how to ensure the paper is anonymized correctly.
Copyright and Licensing: The paper covers the copyright and licensing requirements for accepted ICML 2024 papers, including the use of the Creative Commons Attribution license.

Critical Analysis

The paper provides comprehensive and well-structured instructions for authors submitting to the ICML 2024 conference. The guidelines are clear and detailed, ensuring that all submissions adhere to the same standards.

However, the paper does not discuss any potential limitations or caveats of the submission and formatting requirements. It would be helpful if the instructions acknowledged the challenges that authors may face in adhering to the guidelines, especially for researchers from diverse backgrounds or with limited resources.

Additionally, the paper could benefit from including more information on the review process and the criteria used by the program committee to evaluate the submitted papers. This would help authors understand the expectations and better prepare their submissions.

Conclusion

The submission and formatting instructions for ICML 2024 provide a clear and comprehensive set of guidelines for authors. By following these instructions, researchers can ensure that their work is properly formatted and submitted to the conference, increasing the chances of it being accepted and presented. The guidelines contribute to maintaining the high standards and integrity of the ICML conference, which is a leading event in the field of machine learning.

This summary was produced with help from an AI and may contain inaccuracies - check out the links to read the original source documents!

Follow @aimodelsfyi on 𝕏 →

Related Papers

EllipBench: A Large-scale Benchmark for Machine-learning based Ellipsometry Modeling

Yiming Ma, Xinjie Li, Xin Sun, Zhiyong Wang, Lionel Z. Wang

Ellipsometry is used to indirectly measure the optical properties and thickness of thin films. However, solving the inverse problem of ellipsometry is time-consuming since it involves human expertise to apply the data fitting techniques. Many studies use traditional machine learning-based methods to model the complex mathematical fitting process. In our work, we approach this problem from a deep learning perspective. First, we introduce a large-scale benchmark dataset to facilitate deep learning methods. The proposed dataset encompasses 98 types of thin film materials and 4 types of substrate materials, including metals, alloys, compounds, and polymers, among others. Additionally, we propose a deep learning framework that leverages residual connections and self-attention mechanisms to learn the massive data points. We also introduce a reconstruction loss to address the common challenge of multiple solutions in thin film thickness prediction. Compared to traditional machine learning methods, our framework achieves state-of-the-art (SOTA) performance on our proposed dataset. The dataset and code will be available upon acceptance.

7/26/2024

A Comprehensive Case Study on the Performance of Machine Learning Methods on the Classification of Solar Panel Electroluminescence Images

Xinyi Song, Kennedy Odongo, Francis G. Pascual, Yili Hong

Photovoltaics (PV) are widely used to harvest solar energy, an important form of renewable energy. Photovoltaic arrays consist of multiple solar panels constructed from solar cells. Solar cells in the field are vulnerable to various defects, and electroluminescence (EL) imaging provides effective and non-destructive diagnostics to detect those defects. We use multiple traditional machine learning and modern deep learning models to classify EL solar cell images into different functional/defective categories. Because of the asymmetry in the number of functional vs. defective cells, an imbalanced label problem arises in the EL image data. The current literature lacks insights on which methods and metrics to use for model training and prediction. In this paper, we comprehensively compare different machine learning and deep learning methods under different performance metrics on the classification of solar cell EL images from monocrystalline and polycrystalline modules. We provide a comprehensive discussion on different metrics. Our results provide insights and guidelines for practitioners in selecting prediction methods and performance metrics.

8/13/2024

⚙️

Inverse design of photonic surfaces on Inconel via multi-fidelity machine learning ensemble framework and high throughput femtosecond laser processing

Luka Grbcic, Minok Park, Mahmoud Elzouka, Ravi Prasher, Juliane Muller, Costas P. Grigoropoulos, Sean D. Lubner, Vassilia Zorba, Wibe Albert de Jong

We demonstrate a multi-fidelity (MF) machine learning ensemble framework for the inverse design of photonic surfaces, trained on a dataset of 11,759 samples that we fabricate using high throughput femtosecond laser processing. The MF ensemble combines an initial low fidelity model for generating design solutions, with a high fidelity model that refines these solutions through local optimization. The combined MF ensemble can generate multiple disparate sets of laser-processing parameters that can each produce the same target input spectral emissivity with high accuracy (root mean squared errors < 2%). SHapley Additive exPlanations analysis shows transparent model interpretability of the complex relationship between laser parameters and spectral emissivity. Finally, the MF ensemble is experimentally validated by fabricating and evaluating photonic surface designs that it generates for improved efficiency energy harvesting devices. Our approach provides a powerful tool for advancing the inverse design of photonic surfaces in energy harvesting applications.

6/4/2024

An Automated Machine Learning Approach to Inkjet Printed Component Analysis: A Step Toward Smart Additive Manufacturing

Abhishek Sahu, Peter H. Aaen, Praveen Damacharla

In this paper, we present a machine learning based architecture for microwave characterization of inkjet printed components on flexible substrates. Our proposed architecture uses several machine learning algorithms and automatically selects the best algorithm to extract the material parameters (ink conductivity and dielectric properties) from on-wafer measurements. Initially, the mutual dependence between material parameters of the inkjet printed coplanar waveguides (CPWs) and EM-simulated propagation constants is utilized to train the machine learning models. Next, these machine learning models along with measured propagation constants are used to extract the ink conductivity and dielectric properties of the test prototypes. To demonstrate the applicability of our proposed approach, we compare and contrast four heuristic based machine learning models. It is shown that eXtreme Gradient Boosted Trees Regressor (XGB) and Light Gradient Boosting (LGB) algorithms perform best for the characterization problem under study.

4/9/2024